CS Titanium manufactures a range of Targets made from Tungsten (W), Molybdenum (Mo), Niobium (Nb), and Tantalum (Ta). These are used in physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes for thin-film coating applications.Among them, molybdenum sputtering target and niobium sputtering target are popular products.
W, Mo, Nb, and Ta all have exceptionally high melting points, making them suitable for processes that involve high temperatures, such as physical vapor deposition (PVD) and chemical vapor deposition (CVD).
Tungsten and copper have high thermal conductivity, which aids in uniform film deposition and heat dissipation during target sputtering.
Mo, Nb, and Ta exhibit high chemical inertness, ensuring that they do not react with the process gases or materials used in thin film deposition. This inertness helps maintain target integrity and film purity.
W, Mo, Nb, and Ta targets can be manufactured in various forms, such as planar or rotary targets, to accommodate different deposition systems and requirements.