Niobium Target Parameters
ASTM 4 or finer
16Rms max. or Ra 0.4 ( RMS64 or better)
0.1mm or 0.15％ max
+/-0.010" on all dimensions
Original Powder → HIP → Machine Process → Surface Treatment → Finished Products →Packaging → Inspection
Niobium sputtering target is mainly used in surface engineering materials, such as shipbuilding, chemical industry, liquid crystal display (LCD) and heat resistance, corrosion resistance and high conductivity coating industry, thin film solar industry, low radiation glass industry, flat panel display industry, optical coating industry, tools and decorative coating industry.
In addition to niobium sputtering target, we can also provide niobium-germanium alloy, niobium-tin alloy, niobium-zirconium alloy, niobium-hafnium alloy, niobium-titanium alloy, molybdenum-niobium alloy, aluminum-niobium alloy, lithium niobate alloy and other sputtering targets.
Specialization: At CS Titanium, we specialize in producing customized Niobium Sputtering Targets for both commercial and research applications. Our expertise allows us to create tailored solutions that meet your specific requirements.
Custom Compositions: We can create custom compositions for new proprietary technologies. Our team works closely with you to understand your needs and develop the most suitable Niobium Sputtering Target composition.
Variety of Products: In addition to our Niobium Sputtering Targets, we offer a wide range of other magnetron sputtering targets, evaporation sources, and deposition materials. These are listed by material throughout our website for easy reference.
Quality Assurance: All our products, including our customized Niobium Sputtering Targets, undergo rigorous quality checks to ensure they meet our high standards and your expectations.
Expert Support: Our team of experts is always ready to provide support and advice, helping you choose the right materials and compositions for your needs.