Tungsten Target Parameters | ||||
Element | W | |||
Purity | ≥99.95%(3N5) | |||
Typical sample dimension | 12mm×80mm×100mm | |||
Density | 19.25 g/cm3 (HIP) | |||
Hardness | HV5:280-310 | |||
Grain Size | 43μm | |||
Appearance | Ra≤0.4μm | |||
Impurity Content | Ti | ≤10ppm | Ni | ≤6ppm |
Na | ≤5ppm | Pb | ≤1ppm | |
C | ≤20ppm | P | ≤8ppm | |
Ca | ≤10ppm | Cu | ≤5ppm | |
Mg | ≤7ppm | |||
Si | ≤10ppm | |||
Al | ≤5ppm | |||
As | ≤10ppm | |||
Fe | ≤10ppm |
Widely used in flat display, solar cell, integrated circuit, automotive glass, microelectronics, memory, X-ray tube, medical equipment, melting equipment and other products.
In addition to tungsten targets, we can also provide tungsten-titanium, silver- tungsten, tungsten-molybdenum, nickel-tungsten, tungsten trioxide, tungsten sulfide, tungsten diboride, tungsten oxide and other sputtering targets.