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Molybdenum sputtering targets include molybdenum plane targets (molybdenum round targets and molybdenum strip-type targets) and molybdenum rotating targets.
Molybdenum plane targets are formed by processing high-quality plates of our company, and feature high density, no crack and sand hole inside, bright surfaces, uniform color and luster as well as accurate dimensions.
Small molybdenum rotary pressing targets are processed by high-quality bars, and feature accurate dimensions, smooth surface, high purity, etc.
Molybdenum rotating targets of the conventional size are produced by a hot isostatic pressing process, and feature high density (10.15 g/cm³), fine grains and good molding.
Conventional density: 10g/cm³~10.15g/cm³;
Special process density: more than 10.15g/cm³．
Element | Mo | |||
Purity | ≥99.95%(3N5) | |||
Typical sample dimension | φ153mm×φ123mm×1114mm | |||
Density | 10.15g/cm3 | |||
Hardness | HV5:246-253 | |||
Grain Size | 35μm | |||
Appearance | Ra≤0.4μm | |||
Impurity Content | Pb | ≤5ppm | C | ≤20ppm |
Cd | ≤5ppm | Sb | ≤10ppm | |
Si | ≤10ppm | Ni | ≤30ppm | |
Cu | ≤10ppm | P | ≤5ppm | |
Mg | ≤10ppm | N | ≤50ppm | |
Bi | ≤5ppm | |||
Al | ≤15ppm | |||
Ca | ≤15ppm | |||
N | ≤ppm | |||
Note: all the specifications of the molybdenum sputtering target can meet the requirements of customers on high accuracy through machining.
Molybdenum sputtering target can be formed on the substrate film, widely used in electronic components and electronic products, integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices; It can also be used in glass coating field; Molybdenum sputtering target can also be used in wear-resistant materials, high temperature corrosion, decorative supplies and other industries.
In addition to molybdenum sputtering target material, we can also provide molybdenum-titanium alloy, molybdenum-rhenium alloy, molybdenum-niobium alloy, molybdenum-copper alloy, molybdenum-lanthanum alloy, molybdenum-tantalum alloy, etc.
High Purity: Our Molybdenum Sputtering Targets boast a purity level of over 99.97%, ensuring optimal performance and minimal impurities in your coating processes.
Maximum Density: With a density of over 99.5%, our Molybdenum Sputtering Targets provide superior sputtering efficiency and uniformity.
Homogeneous Microstructure: The homogeneous microstructure of our Molybdenum Sputtering Targets ensures consistent sputtering performance and high-quality coatings.
Expertise in Coating Solutions: As a center of expertise for new coating solutions, Changsheng Titanium provides not only high-quality Molybdenum Sputtering Targets but also expert advice and support to help you optimize your coating processes.
Another product you may be interested in: niobium sputtering target.
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
