Typical sample dimension
Note: all the specifications of the molybdenum sputtering target can meet the requirements of customers on high accuracy through machining.
Molybdenum sputtering target can be formed on the substrate film, widely used in electronic components and electronic products, integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices; It can also be used in glass coating field; Molybdenum sputtering target can also be used in wear-resistant materials, high temperature corrosion, decorative supplies and other industries.
In addition to molybdenum sputtering target material, we can also provide molybdenum-titanium alloy, molybdenum-rhenium alloy, molybdenum-niobium alloy, molybdenum-copper alloy, molybdenum-lanthanum alloy, molybdenum-tantalum alloy, etc.
High Purity: Our Molybdenum Sputtering Targets boast a purity level of over 99.97%, ensuring optimal performance and minimal impurities in your coating processes.
Maximum Density: With a density of over 99.5%, our Molybdenum Sputtering Targets provide superior sputtering efficiency and uniformity.
Homogeneous Microstructure: The homogeneous microstructure of our Molybdenum Sputtering Targets ensures consistent sputtering performance and high-quality coatings.
Expertise in Coating Solutions: As a center of expertise for new coating solutions, CS Titanium provides not only high-quality Molybdenum Sputtering Targets but also expert advice and support to help you optimize your coating processes.