Name: Tantalum Target
Brand: Baoji City Changsheng Titanium Co., Ltd.

Tantalum Sputtering Target

Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

Size:

Circular targets: Diameter 15mm up to 400mm x Thickness 3mm up to 28mm
Rectangular targets: Thickness 1mm up to 40mm x Width up to 1000mm x Length up to 3000mm

If you would like to know more about the tantalum sputtering target, please do not hesitate to contact the Changsheng Titanium tantalum target supplier.

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Tantalum Sputtering Target Specification

Grade	3N, 3N5, 4N, with Ta 99.99% min
Recrystallization	95% min
Grain size	ASTM 4 or finer
Surface finish	16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness	0.1mm or 0.15% max
Tolerance	+/-0.010" on all dimensions

Tantalum Sputtering Target Application

Tantalum Sputtering Target is welded with copper back target, and then semiconductor or optical sputtering is carried out to deposit tantalum atoms on the substrate material to realize sputtering coating. Tantalum targets are mainly used in semiconductor coating, optical coating and other industries. In the semiconductor industry, metal (Ta) is currently used to form a barrier layer by physical vapor deposition (PVD).

Tantalum Sputtering Target Alloy Series

In addition to the tantalum sputtering target, we can also provide tantalum-silicon alloy, tantalum-aluminum alloy, tantalum-tungsten alloy, nickel-tantalum alloy, cobalt-zirconium-tantalum alloy, tantalum nitride, tantalum carbide, tantalum boride, tantalum pentoxide, and other sputtering targets.

Advantages of Tantalum Sputtering Target

High Purity: With a purity level exceeding 99.97%, Changsheng Titanium’s tantalum sputtering targets ensure minimal contamination, leading to the production of high-quality, reliable products.

Maximum Density: These tantalum sputtering targets boast a maximum density of over 98%. This high density ensures efficient sputtering, which is crucial for enhancing the quality of the thin film deposition.

Homogeneous Microstructure and Chemical Composition: The tantalum sputtering targets from Changsheng Titanium exhibit a homogeneous microstructure and chemical composition. This uniformity ensures consistent sputtering rates, leading to uniform thin film deposition, which is vital for the performance of the end product.