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A titanium sputtering target is installed on the vacuum deposition machine for coating. It can be plated with conductive film, insulating film, decorative film, superhard film, lubricating film, magnetic film, and other functional films. It is a material used to manufacture thin films using sputtering deposition or thin film deposition technology. In this process, the sputtering target material starts as a solid, which is decomposed into tiny particles by gas ions, forming a spray and covering another material. If you would like to know more about titanium sputtering target disc, please do not hesitate to contact the CS Titanium Tube Supplier.
Type | Material | Purity |
Metal target | W, Mo, Zr, Ta, Nb, Ni, Ti, Cr, Al, Cu, Si, Hf | 2N5-5N 99.5%-99.999% |
Alloy target | Ti-Al (50: 50at%, 80: 20at%, 70: 30at%, 60: 40at%33: 67at%) , Si-Al (90: 10wt%, 70: 30wt%, 50: 50wt%) Cr-Al (30: 70at%, 50: 50at%, 70: 30at%） Cr-Si (50: 50wt%) W-Ti (90: 10wt%) Ni-Cr (80: 20wt%) Ti-Zr, Ti-Si, Ti-Nb, Nb-Zr, Nb-W-Zr, Ti-Al-Si | >99.9% |
Shape | General size | drawing |
Disc/Multi arc | diameter60/65/95/100*30/32/40/45mm | Other sizes can be customized |
Flat/planar | Wide max 300mm, length max3000mm | |
Rotary/tubular | OD70 x Wt7 x L mm OD80 x Wt8 x L mm OD127 x ID105 x L mm OD146 x ID136 x L mm OD219 x ID194 x L mm OD300 x ID155 x L mm |
Architectural glass, car using glass, graphic display field
Electronic and semiconductor field
Decoration and mould field
Optics coating materials
Solar photovoltaic industry
Wear resistant coating
Powder metallurgy(HIP)
Melting processing(Melting,forging,drilling,machining)
Thermal spraying
Target bonding
Emission Spectroscopy
Direct-coupled plasma spectrometry
Atomic absorption spectrometry
Scanning electron microscopy
X-ray diffraction
High Ductility: The high ductility of these titanium sputtering targets allows them to be shaped and molded into various forms without breaking or cracking, providing flexibility in their usage.
Excellent Thermal Conductivity: The titanium sputtering targets from CS Titanium exhibit excellent thermal conductivity, ensuring efficient heat dissipation, which is crucial in maintaining the longevity and performance of the equipment they are used in.
Optimum, Homogeneous Microstructure: The titanium sputtering targets have an optimum, homogeneous microstructure that ensures consistent sputtering rates, leading to high-quality thin film deposition.
Highest Material Purity: CS Titanium guarantees the highest material purity in its titanium sputtering targets. This high purity level reduces the risk of contamination, ensuring the production of high-quality, reliable products.
Purity: The titanium sputtering target must have a high level of purity, typically above 99.99%, to ensure optimal performance during the sputtering process.
Impurity Content: The impurity content in the titanium sputtering target must be minimized. Any impurities can adversely affect the sputtering process and the quality of the thin film produced.
Density: The titanium sputtering target must have a high density, close to the theoretical density of titanium. A high-density target ensures uniform sputtering and a consistent thin film.
Grain Size: The grain size of the titanium sputtering target must be uniform. This ensures consistent sputtering and a high-quality thin film.
Grain Size Distribution: CS Titanium uses advanced manufacturing processes to control the grain size distribution in the titanium sputtering target, ensuring the highest quality targets for our clients.
| titanium seamless tube | welding titanium tubing | gr5 titanium tube | titanium capillary tube |
| titanium rectangular tube | titanium coil tube | nitinol tubing stock | sintered titanium |
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
